Gyeon Q2M Compound+ - 1000ml - Polish

Q²M Compound + is an abrasive polish offering an improved level of scratch removal and high abrasion with low dust levels and limited secondary defects. Although it leaves slight holograms, these are easily removed in a single pass with Q²M Polish.

Q²M Compound + is unlike any abrasive polish. Water-based, speed and temperature must be reduced for best results. Work in small sections, moving the machine slowly over the surface. TIP: Q²M Compound + has its highest correction capabilities during the first period of the work cycle. Each attempt should take no more than 45 seconds.